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ICOP & ICPET 2014, 20 - : 1005-1008 Back to browse issues page
Experimental and Computer Calculated Sputtering Yield of Sputtered Au by Ne Ions at Different Energies and Various Incidence Angles
Ehsan Dorani Mr. * 1, S. Peyman Abbasi Mr.2, Abolhassan Alimoradi Mr.2
1- Islamic Azad University, Kahnouj Branch
2- Iranian National Center for Laser Science and Technology
Abstract:   (2282 Views)
Nowadays a plenty of applications of thin film in different subjects such as scientific and industrial items has been grown. Au deposition is very important in microelectronic device fabrication. In this research project we studied Au sputtering in different energies and different angles of incident ions. Results show that the measured sputtering yield confirms the results that reached by TRIM.SP software. In specific range, sputtering yield increases by increasing energy and incident angle of bombardment ion particles.
Keywords: Au sputtering, sputtering yield, molecular dynamics model, incident ion energy, angle of sputtering collision ions
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Type of Study: Research | Subject: Special
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Dorani E, Abbasi S P, Alimoradi A. Experimental and Computer Calculated Sputtering Yield of Sputtered Au by Ne Ions at Different Energies and Various Incidence Angles. ICOP & ICPET. 2014; 20 :1005-1008
URL: http://opsi.ir/article-1-402-en.html


Volume 20 - Back to browse issues page
انجمن اپتیک و فوتونیک ایران Optics and Photonics Society of Iran
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