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Dorani E, Abbasi S P, Alimoradi A. Experimental and Computer Calculated Sputtering Yield of Sputtered Au by Ne Ions at Different Energies and Various Incidence Angles. ICOP & ICPET _ INPC _ ICOFS 2014; 20 :1005-1008
URL: http://opsi.ir/article-1-402-en.html
URL: http://opsi.ir/article-1-402-en.html
1- Islamic Azad University, Kahnouj Branch
2- Iranian National Center for Laser Science and Technology
2- Iranian National Center for Laser Science and Technology
Abstract: (3895 Views)
Nowadays a plenty of applications of thin film in different subjects such as scientific and industrial items has been grown. Au deposition is very important in microelectronic device fabrication. In this research project we studied Au sputtering in different energies and different angles of incident ions. Results show that the measured sputtering yield confirms the results that reached by TRIM.SP software. In specific range, sputtering yield increases by increasing energy and incident angle of bombardment ion particles.
Keywords: Au sputtering, sputtering yield, molecular dynamics model, incident ion energy, angle of sputtering collision ions
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