Optics and Photonics Society of Iran

Zn pure thin films were prepared by magnetron sputtering deposition on quartz substrate. Then, they were annealed at a temperature of 700°C and 5 different time intervals, i.e., 1h, 2h, 3h, 4h and 5h to form zinc oxide nanostructure thin films. Investigation of UV spectrum as well as calculation of optical parameters showed that annealing duration is an important factor affecting optical properties of high quality ZnO thin films. For energies higher than 3.25 eV, optical conductivity increased exponentially which was corresponded with calculated energy gaps. As a result, this type of ZnO nanostructure thin films is recommended for manufacturing of high quality touch screens. On the other hand, study of photoluminescence spectrum with high exciton emission is a confirming factor of low defect of zinc oxide nanoparticles prepared by this method.