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Ashrafganjoie M, Hassani K. Thin Film Profile Measurement Using Interferometry. ICOP & ICPET _ INPC _ ICOFS 2015; 21 :1073-1076
URL: http://opsi.ir/article-1-528-en.html
URL: http://opsi.ir/article-1-528-en.html
1- University of Tehran
Abstract: (4557 Views)
One of the popular techniques for the measurement of the thickness of thin films is based on light interferometry, which has the advantage of being non-destructive and calibration-free. However, the uncertainty achieved by this method is not usually better than 20-30 nm, and it can only measure the average film thickness. In this work, by using an interference microscope and fitting the interference patterns to an appropriate model, we are able to improve the precision to less than 10nm, and also provide the film thickness profile.
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