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ICOP & ICPET 2015, 21 - : 1073-1076 Back to browse issues page
Thin Film Profile Measurement Using Interferometry
Mehdi Ashrafganjoie Mr * 1, Khosrow Hassani Mr1
1- University of Tehran
Abstract:   (1912 Views)
One of the popular techniques for the measurement of the thickness of thin films is based on light interferometry, which has the advantage of being non-destructive and calibration-free. However, the uncertainty achieved by this method is not usually better than 20-30 nm, and it can only measure the average film thickness. In this work, by using an interference microscope and fitting the interference patterns to an appropriate model, we are able to improve the precision to less than 10‌nm, and also provide the film thickness profile.
Keywords: Interferometry, Thin Film, Thickness Measurement, Interference Microscope
Full-Text [PDF 602 kb]   (2957 Downloads)    
Type of Study: Research | Subject: Special
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Ashrafganjoie M, Hassani K. Thin Film Profile Measurement Using Interferometry. ICOP & ICPET. 2015; 21 :1073-1076
URL: http://opsi.ir/article-1-528-en.html


Volume 21 - Back to browse issues page
انجمن اپتیک و فوتونیک ایران Optics and Photonics Society of Iran
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