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ICOP & ICPET 2015, 21 - : 1029-1032 Back to browse issues page
Improvement of Femtosecond laser induced damage threshold of TiO2 optical films by using controlled annealing process
Alireza Bananej Dr * 1, Mahdieh Khatiri Mrs1, Zohreh Parsa Mrs2
1- Atomic energy organization of iran
2- Kharazmi university
Abstract:   (2048 Views)
Tio2 optical films with 200nm thickness were deposited by using electron beam evaporation technique on optical BK7 glass and annealed at different time-temperature gradient. As a consequence of measured transmission spectrum and envelope method the absorption coefficient of three samples can be determined. By using Tauce method, the energy bandgap of the samples can be calculated. Finally the laser induced damage threshold (LIDT) of the samples at 1030nm and pulse duration 20-500fs can be obtained. The results show that LIDT can improve by using slowly varying time temperature gradient annealing process.
Keywords: Femtosecond laser induced damage, laser damage of optical thin films, induced damage threshold of TiO2
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Type of Study: Research | Subject: Special
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Bananej A, Khatiri M, Parsa Z. Improvement of Femtosecond laser induced damage threshold of TiO2 optical films by using controlled annealing process. ICOP & ICPET. 2015; 21 :1029-1032
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Volume 21 - Back to browse issues page
انجمن اپتیک و فوتونیک ایران Optics and Photonics Society of Iran
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