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ICOP & ICPET 2014, 20 - : 1053-1056 Back to browse issues page
Structure investigation and residual stress optimization of Cr nanolayer on glass and GaAs substrates
Mahdie Parvizian Mrs. * 1, Fariba Rahimi ashtari Miss.1, Amir Goodarzi Mr.1, Behrang Sabrlouie Mr.1, Peyman Abbasi Mr.1
1- Iranian National Center for Laser Science and technology
Abstract:   (3148 Views)
In this study surface roughness, deposition rate and residual stress of Cr thin film on glass and GaAs substrates were investigated by AFM analysis, thickness measurement and substrate curvature method. For this aim Cr layer with different thicknesses, 40-120 nm, was deposited on mentioned substrates by RF sputtering. Results show that deposition rate and surface roughness of Cr layer on glass is more than GaAs and on both substrates by increasing thickness, roughness increases. Also optimized thickness for residual stress obtained at 58 nm for GaAs substrate and at 62 nm for glass.
Keywords: Cr, deposition rate, residual stress, roughness.
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Type of Study: Research | Subject: Special
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parvizian M, rahimi ashtari F, goodarzi A, sabrlouie B, abbasi P. Structure investigation and residual stress optimization of Cr nanolayer on glass and GaAs substrates . ICOP & ICPET. 2014; 20 :1053-1056
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