[Home ] [Archive]   [ فارسی ]  
:: Volume 20 - ::
ICOP & ICPET 2014, 20 - : 697-700 Back to browse issues page
Fabrication and coating of nano-porous silica anti-reflection thinfilm via layer by layer deposition process on glass substrate
Mohamadreza Mojab 1, Akbar Eshaghi * 1
1- Maleke Ashtar university of technology
Abstract:   (4191 Views)
Abstract- In this study, nano-porous silica (SiO2) anti-reflection thinfilm fabricated on glass substrate via layer by layer deposition process. Optical properties and surface morphology was investigated by using UV / vis spectrophotometer and FE-SEM. The results showed that nanostructured porous silica with an average pore size of 50 nm is formed on the glass surface and a maximum transmittance of 97% and a minimum reflection of 1.8% in the wavelength range of visible light (550 nm) was obtained.
Keywords: anti-reflection, nano-porous, thinfilm
Full-Text [PDF 555 kb]   (1214 Downloads)    
Type of Study: Research | Subject: Special
Send email to the article author

Add your comments about this article
Your username or Email:

CAPTCHA code


XML   Persian Abstract   Print


Download citation:
BibTeX | RIS | EndNote | Medlars | ProCite | Reference Manager | RefWorks
Send citation to:

mojab M, Eshaghi A. Fabrication and coating of nano-porous silica anti-reflection thinfilm via layer by layer deposition process on glass substrate . ICOP & ICPET. 2014; 20 :697-700
URL: http://opsi.ir/article-1-298-en.html


Volume 20 - Back to browse issues page
انجمن اپتیک و فوتونیک ایران Optics and Photonics Society of Iran
Persian site map - English site map - Created in 0.05 seconds with 30 queries by YEKTAWEB 3781