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Experimental investigation of substrate temperature and deposition rate on physical properties of ITO thin film
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| Arezoo Moshabaki *1, Erfan Kadivar1, Alireza Firoozi Far1 |
| 1- Department of Physics, Shiraz University of Technology |
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Abstract: (443 Views) |
| In this work, the effect of substrate temperature and rate deposition on the electrical, optical, and morphology of ITO thin film coated by DC magnetron sputtering system on BK7 substrate have been experimentally investigated. After the deposition process, some of the sample were annealed in vacuum and air. The transmission spectra were measured before and after the annealing by spectrophotometer. The sheet resistance was measured with four-point tester. The surface topology was analyzed by an atomic force microscopie (AFM). Our experimental results indicate that the resistance and line roughness decreases by decreasing deposition rate. |
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| Keywords: ITO thin film, Substrate temperature, Deposition rate, DC magnetron sputtering |
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Full-Text [PDF 871 kb]
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Type of Study: Research |
Subject:
Special
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