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In this paper a WO3/Cu/WO3 (WCW) nano-multilayer structure is designed theoretically and optimum structure are calculated as air/WO3(42nm)/Cu(12nm)/WO3(46nm)/glass. Several conductive transparent WCW nano-multilayer films are deposited on a glass substrate at room temperature by thermal evaporation method. Changes in the electrical and optical properties of samples are investigated with respect to annealing in air at different temperatures. High-quality nano-multilayer films with the sheet resistance of 7 Ω/sq and the optical transmittance of 77% and the figure of merit of 1.6 mΩ-1 at 150 °C annealing temperature are obtainedd.
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