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Si3N4 thin film was deposited by RF-sputtering and SiO thin film was deposited by PVD and both of them wereprepared in vacuum chamber. Highly sensitive permeation rates measurements are crucial for the characterization and development of OLEDs. Here we use electrical calcium test for measuring ultralow permeation rates. The amount of oxidative degradation in a thin Ca sensor is monitored by resistance measurements. After depositing calcium by PVD method in vacuum chamber , samples were encapsulated with SiO/Si3N4 thin film, (SiO/Si3N4)×5 multilayer and compare with glass cover. Water vapor transmission rates for thes samples were determind by resistance measurements.
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