:: Volume 21 - ::
ICOP & ICPET 2015, 21 - : 1321-1324 Back to browse issues page
Optical Emission Spectroscopy of Ar-N2 plasma in DC magnetron sputtering
Saeed Golshan Khavas Mr *1, Saeed Ghasemi Mr2, Ataollah Koohian1, Hamid Reza Ghomi2
1- University of Tehran
2- University of Shahid Beheshti
Abstract:   (2584 Views)
Effects of nitrogen percentage were investigated on plasma parameters and plasma species, also these parameters were investigated during the deposition time. Results showed that breakdown voltage increased with increasing percentage of nitrogen and plasma voltage decreased during the deposition time. OES results showed that with increasing nitrogen percentage, argon relative ionization and relative dissociation of nitrogen increased, while the relative ionization of nitrogen decreased. OES results also showed that the argon relative ionization, relative excitation of molecular nitrogen and relative dissociation of nitrogen decreased during the deposition time, conversely the relative ionization of nitrogen increased.
Keywords: Tantalum nitride, Optical Emission Specroscopy, magnetron sputtering, breakdown voltage
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Type of Study: Research | Subject: Special


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