TY - JOUR T1 - Fabrication of single anti-reflection layer by introducing porous structure on silicon substrate by using chemical etching TT - ساخت تک لایه ضد بازتاب پهن باند بر زیر لایه سیلیکونی به روش متخلخل سازی به وسیله سونش شیمیایی JF - opsi JO - opsi VL - 24 IS - 0 UR - http://opsi.ir/article-1-1642-en.html Y1 - 2018 SP - 497 EP - 500 KW - Anti-reflection layer KW - Porous surface KW - MACE KW - Solar cells N2 - Metal assisted chemical etching (MACE) method is an effective process for the fabrication of single anti-reflection layer at room temperature. Nanostructures on silicon substrate with different immersion coating time and different etching time have been fabricated. The reflection on porous surface with coating and etching time of 40s and 5h respectively, in spectral range of 400-5000 nanometer have been achieved lower than 2.1%. Therefore, the structure of single anti-reflection layer in wide spectral range can be obtained through low cost and without advanced equipment at room temperature, that is used in many optic systems and solar cells to increase efficiency and performance. M3 ER -