Association Mission
The mission of the association is to advance the creation, communication and application of knowledge to benefit society and improve people's lives.
Membership
Contact Us
Download citation:
BibTeX | RIS | EndNote | Medlars | ProCite | Reference Manager | RefWorks
Send citation to:
BibTeX | RIS | EndNote | Medlars | ProCite | Reference Manager | RefWorks
Send citation to:
Mehrabian S. Investigation of the Sputtering Effects on the Amorphous Carbon Films’ Deposition . ICOP & ICPET _ INPC _ ICOFS 2015; 21 :661-664
URL: http://opsi.ir/article-1-666-en.html
URL: http://opsi.ir/article-1-666-en.html
University of Shahrood
Abstract: (2933 Views)
In this paper, the effect of sputtering of high-energy ions on the growth of amorphous carbon films is investigated. Therefore, the ion and neutral movements in the sheath are simulated and their energy at the moment of collision with the substrate is computed. The obtained energy is an input to the SRIM code being used to investigate the sputtering yield under different substrate biases and ionization degrees. Our results show that the sputtering of high-energy ions does not affect the films’ growth. It also decreases with increment of the substrate bias which is due to the transition toward ion implantation.
Send email to the article author
Rights and permissions | |
This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License. |