TY - JOUR JF - opsi JO - ICOP & ICPET _ INPC _ ICOFS VL - 21 IS - 0 PY - 2015 Y1 - 2015/3/01 TI - A new approach for absorption enhancement in plasmonic photodetectors TT - A new approach for absorption enhancement in plasmonic photodetectors N2 - A new structure for absorption enhancement in plasmonic MSM photodetector is presented. This structure contains a layer of SiO2 between gold and semiconductor layers. The SiO2 layer creates a more suitable path for light to penetrate under the metal layer, transmits the wave to both sides of the device, involves a greater part of semiconductor in electron-hole generation, and increases the coupling of light into the semiconductor. This construction is simulated using Lumerical FDTD. Absorption enhancement in this paper is 4 times greater than similar structures. SP - 1675 EP - 1678 AU - Jamalpoor, Kamal AU - Zarifkar, Abbas AU - Alighanbari, Abbas AD - Shiraz University KW - photodetector KW - surface plasmon polaritons KW - nanostructures KW - grating UR - http://opsi.ir/article-1-791-en.html ER -