RT - Journal Article T1 - Thin Film Profile Measurement Using Interferometry JF - opsi YR - 2015 JO - opsi VO - 21 IS - 0 UR - http://opsi.ir/article-1-528-en.html SP - 1073 EP - 1076 K1 - Interferometry K1 - Thin Film K1 - Thickness Measurement K1 - Interference Microscope AB - One of the popular techniques for the measurement of the thickness of thin films is based on light interferometry, which has the advantage of being non-destructive and calibration-free. However, the uncertainty achieved by this method is not usually better than 20-30 nm, and it can only measure the average film thickness. In this work, by using an interference microscope and fitting the interference patterns to an appropriate model, we are able to improve the precision to less than 10‌nm, and also provide the film thickness profile. LA eng UL http://opsi.ir/article-1-528-en.html M3 ER -