TY - JOUR T1 - Structure investigation and residual stress optimization of Cr nanolayer on glass and GaAs substrates TT - بررسی ساختاری و بهینه سازی تنش پسماند نانولایه کروم بر روی زیرلایه های شیشه و گالیم آرسناید JF - opsi JO - opsi VL - 20 IS - 0 UR - http://opsi.ir/article-1-422-en.html Y1 - 2014 SP - 1053 EP - 1056 KW - Cr KW - deposition rate KW - residual stress KW - roughness. N2 - In this study surface roughness, deposition rate and residual stress of Cr thin film on glass and GaAs substrates were investigated by AFM analysis, thickness measurement and substrate curvature method. For this aim Cr layer with different thicknesses, 40-120 nm, was deposited on mentioned substrates by RF sputtering. Results show that deposition rate and surface roughness of Cr layer on glass is more than GaAs and on both substrates by increasing thickness, roughness increases. Also optimized thickness for residual stress obtained at 58 nm for GaAs substrate and at 62 nm for glass. M3 ER -