TY - JOUR T1 - Experimental and Computer Calculated Sputtering Yield of Sputtered Au by Ne Ions at Different Energies and Various Incidence Angles TT - Experimental and Computer Calculated Sputtering Yield of Sputtered Au by Ne Ions at Different Energies and Various Incidence Angles JF - opsi JO - opsi VL - 20 IS - 0 UR - http://opsi.ir/article-1-402-fa.html Y1 - 2014 SP - 1005 EP - 1008 KW - Au sputtering KW - sputtering yield KW - molecular dynamics model KW - incident ion energy KW - angle of sputtering collision ions N2 - Nowadays a plenty of applications of thin film in different subjects such as scientific and industrial items has been grown. Au deposition is very important in microelectronic device fabrication. In this research project we studied Au sputtering in different energies and different angles of incident ions. Results show that the measured sputtering yield confirms the results that reached by TRIM.SP software. In specific range, sputtering yield increases by increasing energy and incident angle of bombardment ion particles. M3 ER -