@ARTICLE{Firoozifar, author = {Firoozifar, seyyed alireza and Jannesari, Mohammad and zabolian, Hosein and Shahmohammadi, Javad and Varpaei, Mahmoud and Mardiha, Mahdi and }, title = {Design and Fabrication of 3.7-4.8 Micrometer Long-wave Pass Filter with High Reflection on 1064 and 750-900 nm}, volume = {23}, number = {0}, abstract ={In this research design and fabrication of 3.7-4.8 micrometer long-wave pass filter with high reflection on 1064 and 750-900 nm unther 45 degree has been reported. Deposition was performed in vacuum chamber using electron gun deposition method. Quartz crystal was used to monitor the thickness of thin films. Transmission spectra of coated samples were measured using a double-beam spectrophotometer and a FTIR spectrophotometer. Finally the optical long-wave pass filter with minimum reflection 3.8 percent and mean reflection of 98.4 percent in 750-900 nm range and 97.8 percent in 1064 nm was fabricated. }, URL = {http://opsi.ir/article-1-1357-en.html}, eprint = {http://opsi.ir/article-1-1357-en.pdf}, journal = {Accepted and Presented Articles of OPSI Conferences}, doi = {}, year = {2017} }