1- Isfahan Optic Industry
Abstract: (3701 Views)
In this research, we have optimized the condition of RF plasma etching and ITO thin film by DC magnetron sputtering system on acrylic substrates. We want to reach the best adhesion of thin film to the substrate, the maximum optical transmittance of samples in the visible range and the minimum electrical resistant of ITO thin film. The morphology of substrate and thin film were investigated and optimum condition for plasma etching and ITO coating were reached.
Type of Study:
Research |
Subject:
Special