In this paper, the impact of deposition conditions such as substrate temperature, rate of deposition and residual oxygen partial pressure were investigated on the optical properties of yttria thin films. The deposition was made by reactive electron beam evaporation in vacuum of 10-6 orders and measuring reflectance maximum was done by spectroscopy in 400-800 nm region. The results showed that partial pressure of oxygen had the strongest effect on optical properties. Therefore, using this condition, we managed to make thin films structures with different optical properties and the same material.

Keywords: Yttrium dioxide, Packing Density, Porous, Thin film

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